The invention
Direct optical lithography of functional inorganic materials
The invention
- Name of invention
- Direct optical lithography of functional inorganic materials
- Lithographie optique directe de matériaux inorganiques fonctionnels
Invention description
- Description
- By ligand engineering, we created photosensitive inks from nanomaterials, enabling direct lithography without traditional photoresists. This achieves >3200ppi resolution & <100 nm line-edge roughness, enhancing micro-display manufacturing.
INVENTORS
Nanjing University inventor 3701713461_3882
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