Informations

Stand number

E128

Exhibition class

N: Optics – Photography – Cinematography - Eyewear

Technical description

By ligand engineering, we created photosensitive inks from nanomaterials, enabling direct lithography without traditional photoresists. This achieves >3200ppi resolution & <100 nm line-edge roughness, enhancing micro-display manufacturing.

Simplified description

We developed innovative inks using nanomaterials that react to light, allowing us to create incredibly detailed images without traditional methods. This breakthrough achieves ultra-high resolutions, ideal for improving the production of tiny displays.